1-乙氧基乙基-2,3-二甲基咪唑双三氟甲烷磺酰亚胺盐
1-ethoxyethyl-2,3-dimethylimidazolium bis((trifluoromethyl)sulfonyl)imide
- 分子式:C11H17F6N3O5S2
- 分子量:449.39
- CAS编号:178631-01-1
- 纯度:98%
基本信息
产品名称: | 1-乙氧基乙基-2,3-二甲基咪唑双三氟甲烷磺酰亚胺盐 | ||
英文名称: | 1-ethoxyethyl-2,3-dimethylimidazolium bis((trifluoromethyl)sulfonyl)imide | ||
CAS编号: | 178631-01-1 | 简 写: | EOEMMImNTf2 |
分 子 式 : | C11H17F6N3O5S2 | 分 子 量 : | 449.39 |
纯 度: | 98% | 产品编号: | CP1169 |
物性数据
项目 | 数据 | 测试条件 | 备注 | 数据来源 |
表面张力 mN/m | 35.6 | 液体, Ring tensiometer | ILThermo | |
密度 g/mL | 1.53 | SciFinder | ||
密度 g/mL | 1.5053 | 液体, Pycnometric method | ILThermo | |
粘度 cP | 33 | 液体, Cone and plate viscometry | ILThermo | |
折光率 | 1.4273 | 液体, Standard Abbe refractometry | ILThermo |
参考谱图
1-乙氧基乙基-2,3-二甲基咪唑双三氟甲烷磺酰亚胺盐,EOEMMImNTf2,178631-01-1,1-ethoxyethyl-2,3-dimethylimidazolium bis((trifluoromethyl)sulfonyl)imide
安全信息
Code |
Hazard Statement |
Source |
---|---|---|
H335 |
May cause respiratory irritation |
Expert Curated |
H319 |
Causes serious eye irritation |
Expert Curated |
H315 |
Causes skin irritation |
Expert Curated |
Other Names and Identifiers
Canonical SMILES
O=S(=O)([N-]S(=O)(=O)C(F)(F)F)C(F)(F)F.O(C)CC[N+]=1C=CN(C1)C
InChI
InChI=1S/C7H13N2O.C2F6NO4S2/c1-8-3-4-9(7-8)5-6-10-2;3-1(4,5)14(10,11)9-15(12,13)2(6,7)8/h3-4,7H,5-6H2,1-2H3;/q+1;-1
InChI Key
QTWXKUATXFJTAM-UHFFFAOYSA-N
5 Other Names for this Substance
- 1H-Imidazolium, 1-(2-methoxyethyl)-3-methyl-, salt with 1,1,1-trifluoro-N-[(trifluoromethyl)sulfonyl]methanesulfonamide (1:1) (9CI)
- Methanesulfonamide, 1,1,1-trifluoro-N-[(trifluoromethyl)sulfonyl]-, ion(1-), 1-(2-methoxyethyl)-3-methyl-1H-imidazolium (9CI)
- 1-(1-Methoxyethyl)-3-methylimidazolium bis(trifluoromethylsulfonyl)amide
- 1-(2-Methoxyethyl)-3-methylimidazolium bis(trifluorosulfonyl)imide
- 1-(2-Methoxyethyl)-3-methylimidazolium bis[(trifluoromethyl)sulfonyl]amide
参考文献
Experimental Properties
Chemical
Density
Electrical
Flow and Diffusion
Experimental Spectra
1H-NMR
- (1) Zhang, Jianhao; Industrial & Engineering Chemistry Research, (2014), 53(43), 16633-16643, CAplus
- (2) Chen, Zheng Jian; RSC Advances, (2012), 2(28), 10564-10574, CAplus
- (3) Zhang, Shiguo; New Journal of Chemistry, (2012), 36(4), 1043-1050, CAplus
- (4) Bara, Jason E.; Industrial & Engineering Chemistry Research, (2007), 46(16), 5380-5386, CAplus
- (5) Bara, Jason E.; Industrial & Engineering Chemistry Research, (2007), 46(16), 5380-5386, CAplus
- (6) Kolbeck, Claudia; Langmuir, (2008), 24(17), 9500-9507, CAplus
- (7) Mota, Andreia; Physical Chemistry Chemical Physics, (2011), 13(33), 15094-15102, CAplus
- (8) Shimojo, Kojiro; Analytical Chemistry, (2006), 78(22), 7735-7742, CAplus
- (9) Fei, Zhaofu; Journal of Physical Chemistry B, (2007), 111(34), 10095-10108, CAplus