N-己基-N-甲基吡咯烷双(三氟甲烷磺酰)亚胺盐
N-hexyl-N-methylpyrrolidinium bis((trifluoromethyl)sulfonyl)imide
- 分子式:C13H24F6N2O4S2
- 分子量:450.46
- CAS编号:380497-19-8
- 纯度:98%
基本信息
产品名称: | N-己基-N-甲基吡咯烷双(三氟甲烷磺酰)亚胺盐 | ||
英文名称: | N-hexyl-N-methylpyrrolidinium bis((trifluoromethyl)sulfonyl)imide | ||
CAS编号: | 380497-19-8 | 简 写: | Py16NTf2 |
分 子 式 : | C13H24F6N2O4S2 | 分 子 量 : | 450.46 |
纯 度: | 98% | 产品编号: | CP0886 |
物性数据
参考谱图
安全信息
Code |
Hazard Statement |
Source |
---|---|---|
H335 |
May cause respiratory irritation |
Expert Curated |
H319 |
Causes serious eye irritation |
Expert Curated |
H315 |
Causes skin irritation |
Expert Curated |
Other Names and Identifiers
Canonical SMILES
O=S(=O)([N-]S(=O)(=O)C(F)(F)F)C(F)(F)F.CCCCCC[N+]1(C)CCCC1
InChI
InChI=1S/C11H24N.C2F6NO4S2/c1-3-4-5-6-9-12(2)10-7-8-11-12;3-1(4,5)14(10,11)9-15(12,13)2(6,7)8/h3-11H2,1-2H3;/q+1;-1
InChI Key
WHLFUNXODNBHOT-UHFFFAOYSA-N
5 Other Names for this Substance
- 1-Hexyl-1-methylpiperidinium bis(trifluoromethylsulfonyl)imide
- 1-Hexyl-1-methylpyrrolidinium bis(trifluoromethylsulfonyl)amide
- 1-Hexyl-1-methylpyrrolidinium bis(trifluoromethylsulfonyl)imide
- Hexylmethylpyrrolidinium bis(trifluoromethanesulfonyl)imide
- N-Hexyl-N-methylpyrrolidinium bis(trifluoromethanesulfonyl)imide
参考文献
Experimental Properties
Chemical
Density
Electrical
Flow and Diffusion
- (1) Jin, Hui; Journal of Physical Chemistry B, (2008), 112(1), 81-92, CAplus
- (2) Appetecchi, Giovanni B.; Electrochimica Acta, (2009), 54(4), 1325-1332, CAplus
- (3) Bernard, Uditha L.; Journal of Physical Chemistry C, (2010), 114(48), 20472-20478, CAplus
- (4) Rehman, Abdul; Analytical Chemistry (Washington, DC, United States), (2011), 83(20), 7823-7833, CAplus
Thermal
- (1) Furlani, M.; Electrochimica Acta, (2011), 57, 220-227, CAplus
- (2) Appetecchi, Giovanni B.; Electrochimica Acta, (2009), 54(4), 1325-1332, CAplus
- (3) Jin, Hui; Journal of Physical Chemistry B, (2008), 112(1), 81-92, CAplus
- (4) Deyko, Alexey; Physical Chemistry Chemical Physics, (2009), 11(38), 8544-8555, CAplus
- (5) Rehman, Abdul; Analytical Chemistry (Washington, DC, United States), (2011), 83(20), 7823-7833, CAplus